What is a Tetra methylammonium hydroxide (TMAH)?

Tetra methylammonium hydroxide (TMAH) is an organic compound with the chemical formula (CH₃)₄NOH, consisting of a quaternary ammonium salt with four methyl groups (–CH₃) attached to a nitrogen atom, bonded with a hydroxide (OH⁻) ion. In aqueous solutions, TMAH demonstrates strong alkalinity and is commonly used in organic chemistry and semiconductor industries.

TMAH is primarily employed in organic synthesis and catalytic reactions, particularly for dehydrogenation reactions and polymerization processes. In the semiconductor industry, it plays a crucial role in cleaning processes, especially in silicon wafer etching, where it aids in removing silicon oxide layers.

TMAH is typically produced by reacting a tetramethylammonium salt with sodium hydroxide (NaOH) or potassium hydroxide (KOH). High-purity TMAH is often required for specialized applications, and purification steps may be involved.

TMAH is highly corrosive and should be handled with caution, as it can cause severe damage to skin and eyes. Appropriate protective equipment, including gloves and goggles, should always be used, and safety guidelines should be followed during its handling.

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