What is a Sputtering equipment?

A sputtering device is a device that uniformly creates a very thin film on the surface of an object. It is mainly used for film formation of semiconductors and liquid crystals, and is one of the same physical vapor deposition methods (PVD methods) as vacuum deposition and ion plating. The strength of film formation using a sputtering device is that the film thickness can be made uniform with high accuracy and the film can be made durable because it uses electrical action. It is similar to the vapor deposition equipment often used for film formation, but the advantage is that it can form films of refractory metal or alloy materials. It may also be used to clean the surface of an object.

Application of Sputtering equipment

Thin films such as semiconductors, liquid crystals, and plasma displays are produced by sputtering equipment. Sputtering equipment is versatile because it can form high melting point metals and alloys. Recently, metal is formed on the surface of plastic, glass, and film to make it conductive, and it is also used as wiring for transparent electrodes and touch panels, and the range of applications for sputtering equipment is expanding further.

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