What is a ALD equipment / Atomic Layer Deposition?

An ALD system (Atomic Layer Deposition system) is used to deposit extremely thin films by an atomic layer deposition process. This technology is widely used in fields such as semiconductors, solar panels, electronic devices, batteries, and even medical devices. During the ALD process, two types of precursor gases are alternately introduced onto the substrate. These gases undergo chemical reactions, forming a thin film one atomic layer at a time, allowing precise control over the film's thickness at the nanoscale.

The main advantage of ALD is the uniformity and precision of the films it produces. It can create uniform films regardless of the substrate's shape and can be applied to complex geometries. Additionally, the thickness of the film can be precisely controlled, making ALD crucial in fields like nanotechnology and advanced semiconductor manufacturing. ALD is especially important in applications where high-quality thin films are required.

Application of ALD equipment / Atomic Layer Deposition

ALD systems are widely used across various industries. Here are some specific examples:
１．Gate Oxide Layer in Semiconductor Manufacturing: ALD is used to deposit gate oxide layers in semiconductor chip fabrication. These thin films are critical for the operation of transistors and are precisely controlled at the nanoscale.
２．Thin Film Coating in Solar Panels: ALD is applied in solar panels to create high-efficiency light-absorbing films. These films enhance the absorption of light, improving the overall performance of the solar panel.
３．Coating of Battery Electrodes: ALD is also used to deposit thin films on lithium-ion battery electrodes. These films help to extend the cycling life of the electrodes and enable more efficient energy storage.

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