Plasma etching equipment / List of 7 manufacturers
What is a Plasma etching equipment?
Plasma etching refers to a method that uses high vacuum plasma to turn gas into plasma in a vacuum vessel, and scrapes and removes the film with chemical reactions and accelerated ions, and is considered to be a typical example of dry etching. While wet etching is applied to chemicals, dry etching is described as dry because it does not use chemicals. Plasma etching is an indispensable technology for miniaturization and high integration of semiconductors because it excels in anisotropic etching.
Application of Plasma etching equipment
Plasma etching equipment is used in semiconductor manufacturing processes. Generally used in clean ream. In particular, as miniaturization progresses, the level of dust that is generated only when a person wearing clean wear is nearby causes an error, so the semiconductor manufacturing process is performed by remote control without human intervention. In addition, plasma etching is often performed after the photo process (photoresist application, masking, exposure and development), and depending on the type of semiconductor, it may be necessary to repeat it many times to make one product.
Manufacture list of Plasma etching equipment
※Includes information on some trading companies
